LIGO OPTICS

"Q" Substrates Index

Last Updated on 2/21/2008

By Helena Armandula
Email: ahelena@ligo.caltech.edu
 
 

Serial No.

Size

Substrate
Specification

Substrate Drawing

Type B

Coating / Process

Location

Polisher/ Vendor 

Features

S/N 1

3" x 0.1"

E010064-A

X

Part was cleaned and annealed. Now coated
Ta2O5/SiO2
1/8 - 1/8 wave
60 layers

MIT

 Mindrum

Weld produced significant surface damage

S/N 2

3" x 0.1"

E010064-A

X

Part was cleaned and annealed.
(900  C) 
Now coated
Ta2O5 / SiO2
3/8 - 1/8 wave
30 layers

MIT

Mindrum

No damage from weld

S/N 1

3" x 0.1"

E010064-A

D010068-B

 Ta2O5/SiO2   1/4 wave

     2 layers

MIT

Mindrum-Re-polished by Wave Precision

 

S/N 2

3" x 0.1"

  E010064-A

D010068-B

 Ta2O5/SiO2
1/4wave-

    30 layers

Syracuse 

Mindrum-Re-polished by Wave Precision

 

S/N 3

3" x 0.1"

  E010064-A

D010068-B

 Ta2O5/SiO2
1/4wave-

     30 layers

 Syracuse

Mindrum-Re-polished by Wave Precision

 

S/N 4

3" x 0.1"

 E010064-A

D010068-B

Ta2O5/SiO2
1/4 wave

    2 layers

MIT

Mindrum-Re-polished by Wave Precision

 

S/N 5

3" x 0.1"

 E010064-A

 D010068-B

Coating run  failed

 Caltech

 Wave Precision

 

S/N 6

3" x 0.1"

  E010064-A

D010068-B

 Coating run  failed

 Caltech

 Wave Precision

 

S/N 7

3" x 0.1"

 E010064-A

 D010068-B

 

 MIT

 Wave Precision

 

S/N 8

3" x 0.1"

E010064-A

D010068-B

 Coated with Nb2O5 / SiO2

MLD

Wave Precision

 Baked at 400 C for 1 hr 

S/N1A

3" x 0.1"

 E010064-A

D010068-B

 Ta2O5/SiO2
1/8 - 1/8 wave
60 layers

MIT

Wave Precision

 

S/N 2A

3" x 0.1"

 E010064-A

D010068-B

 Ta2O5 / SiO2
3/8 - 1/8 wave
30 layers

MIT

Wave Precision

 

S/N 3A

3" x 0.1"

 E010064-A

D010068-B

 Ta2O5 / Al2O3
Coated at MLD
45 layers

MIT

Wave Precision

 Parts have been coated for 64ppm Transmission Annealed at 350  C

S/N 4A

3" x 0.1"

 E010064-A

D010068-B

 Ta2O5 / Al2O3
Coated at MLD 45 layers

MIT

Wave Precision

Parts have been coated for 64ppm Transmission
Annealed at 350  C 

S/N 9

3" x 0.1"

E010064-A

D010068-B

 

MIT

Wave Precision

 

S/N 10

3" x 0.1"

E010064-A

D010068-B

 

MIT

Wave Precision

 

S/N 13

3" x 0.1"

E010064-A

D010068-B

Ta2O5/SiO2
1/8H - 3/8 waveL

        30 layers

MIT

Wave Precision

 

S/N 14

3" x 0.1"

E010064-A

D010068-B

Ta2O5/SiO2
1/8H - 3/8 waveL

        30 layers

MIT

Wave Precision

 

S/N 15

3" x 0.1"

E010064-A

D010068-B

Ta2O5/SiO2
1/4wave-

     30 layers

Syracuse

Wave Precision

 Annealed at MLD 450  C 

S/N 16

3" x 0.1"

E010064-A

D010068-B

Ta2O5/SiO2
1/4wave-

     30 layers

MIT

Wave Precision

 Annealed at MLD 450  C 

S/N 17

3" x 0.1"

E010064-A

D010068-B

 Coated with
Nb2O5 / SiO2

MIT

Wave Precision

 Annealed at 400  C for 1 hr

S/N 18

3" x 0.1"

E010064-A

D010068-B

Coated with 30 layers doped Ta2O5/SiO2 – Formula #1

MIT

Wave Precision

 SMA run # 02074/1

S/N 19 

3" x 0.1"

E010064-A

D010068-B

30 layers
Ta2O5 / Al2O3
Coated at WaveP

MIT

Wave Precision

Annealed at 350 C for 12 hr 

S/N 20

3" x 0.1"

E010064-A

D010068-B

30 layers
Ta2O5 / Al2O3
Coated at WaveP

Syracuse

Wave Precision

 Annealed at 350 C for 12 hr 

S/N 22

3" x 0.1"

 

E010064-A

 

D010068-B

 

 

MIT

 

Wave Precision

 

One side ion beam etched
(100 nm) at CSIRO

S/N 23

3" x 0.1"

 

E010064-A

 

D010068-B

 

 

MIT

 

Wave Precision

 

Both sides etched at CSIRO

S/N 24

3" x 0.1"

 

E010064-A

 

D010068-B

 

Un-Coated

MIT

Wave Precision

 

Baked at 600 C (control for Formula #2)

S/N 25

3" x 0.1"

 

E010064-A

 

D010068-B

LMA - 30 layers – wave Ta2O5*/SiO2

* Formula 2

MIT

Wave Precision

 

SMA run #04057/21

S/N 26

3" x 0.1"

 

E010064-A

 

D010068-B

 

30 layers  Al2O3 / SiO2

MIT

Wave Precision

 

Baked at 400 C

S/N 27

3" x 0.1"

E010064-A

 

D010068-B

 

30 layers  Al2O3 / SiO2

MIT

Wave Precision

 

Baked at 400 C

S/N 28

3" x 0.1"

E010064-A

 

D010068-B

 

Lost during Hafnium run

(HfL)15

 

Wave Precision

SMA run# 0401821

Re-polished

S/N 30

3" x 0.1"

E010064-A

 

D010068-B

 

(HL)15

Formula 3

 

 

SMA run #04069/3

S/N 31

3" x 0.1"

E010064-A

 

D010068-B

 

Lost during Hafnium run

(HfL)15

 

Wave Precision

SMA run #0402621

Re-polished

S/N 32

3" x 0.1"

E010064-A

 

D010068-B

 

CSIRO – 30 layers – wave Ta2O5/SiO2

 

MIT

Wave Precision

Ion assisted

1st run  -  TaO = 2.140    SiO = 1.474
2nd run  -  TaO = 2.087    SiO = 1.474

S/N 33

3" x 0.1"

E010064-A

 

D010068-B

 

CSIRO - 30 layers – wave Ta2O5/SiO2

 

MIT

Wave Precision

Ion assisted

1st run  -  TaO = 2.140    SiO = 1.474
2nd run  -  TaO = 2.087    SiO = 1.474

S/N 34

3" x 0.1"

E010064-A

 

D010068-B

 

LMA – 30 layers - wave Ta2O5*/SiO2

* Formula 3

MIT

Wave Precision

SMA run #04076/21

S/N 35

3" x 0.1"

E010064-A

 

D010068-B

 

LMA – 30 layers - wave Ta2O5*/SiO2

* Formula 4

MIT

 

SMA run #C040682

 

S/N 44

3" x 0.1"

E010064-A

 

D010068-B

 

CSIRO

MIT

 

Oxygen deficient - Poor stoichiometry

S/N 45

3" x 0.1"

E010064-A

 

D010068-B

 

CSIRO- 30 layers

Ta2O5 / SiO2

MIT

 

Xe run

S/N 16B

3" x 0.1"

E010064-A

 

D010068-B

 

CSIRO

Andri

 

Silica doped Ta2O5

REO1

3" x 0.1"

E010064-A

 

D010068-B

 

CSIRO

Andri

REO

30 lyrs. HfO2/SiO2 - 300 C for 24hrs

REO2

3" x 0.1"

E010064-A

 

D010068-B

 

CSIRO

Andri

REO

30 lyrs. 30% SiO2 in HfO2/SiO2 -550C  for 24hrs

 R605

3" x 0.1"

E010064-A

 

D010068-B

 

CSIRO

Andri

REO

30 layers-TiO2-doped-Ta2O5 (~40%) and SiO2

 Annealed at 600 C for 24 hrs

* Note:  All thin substrates need to be masked before coating  MASK
 

Serial No.

Size

Substrate specification

Substrate Drawing
Type A

Coating / Process

Location

Polisher / Vendor 

Features 

S/N 1

3" x 1"

E010064-A

D010067-B

Ta2O5/SiO2
1/4wave-
30 layers

Glasgow

Mindrum-Re-polished by Wave Precision

 Annealed at 600 C

S/N 2

3" x 1"

 E010064-A

D010067-B

Cleaning / Annealing
-
Coating run  failed

MIT

Mindrum-Re-polished by Wave Precision

 Repolished at OCI

S/N 3

3" x 1"

 E010064-A

D010067-B

Ta2O5/SiO2   1/4 wave -
2 layers

Glasgow

Mindrum-Re-polished by Wave Precision

 Annealed at 600 C

S/N 4

3" x 1"

 E010064-A

D010067-B

Ta2O5/SiO2
1/4wave-
30 layers

Glasgow

Mindrum-Re-polished by Wave Precision

 Annealed at 600 C

S/N 1

3" x 1"

 E010064-A

D010067-B

 

MLD

Wave Precision

 

S/N 2

3" x 1"

 E010064-A

D010067-B

 

Stanford

Wave Precision

 

S/N 3

3" x 1"

E010064-A

D010067-B

 Ta2O5/SiO2
3/8 - 1/8 wave
30 layers

Glasgow

Wave Precision

 Absorption:
0.4ppm +/- 0.1
Identified as III on barrel

S/N 4

3" x 1"

 E010064-A

D010067-B

 Ta2O5/SiO2
1/8 - 1/8 wave
60 layers

Glasgow

Wave Precision

 Identified as IV on barrel

S/N 5

3" x 1"

E010064-A

D010067-B

Coating run  failed 

MIT

Wave Precision

 Identified as 5 on barrel
Repolished at OCI

S/N 6

3" x 1"

 E010064-A

D010067-B

 Ta2O5/SiO2
3/8 - 1/8 wave

        30 layers

Glasgow

Wave Precision

 Absorption:
0.5ppm +/- 0.1
Identified as VI on barrel

S/N 7

3" x 1"

E010064-A

D010067-B

Ta2O5/SiO2
1/8H - 3/8 waveL

        30 layers

Glasgow

Wave Precision

 Annealed at 600 C

S/N 8

3" x 1"

E010064-A

D010067-B

Ta2O5/SiO2
1/8H - 3/8 waveL

        30 layers

Glasgow

Wave Precision

 Annealed at 600 C

S/N 9

3" x 1"

E010064-A

D010067-B

Coated with Nb2O5 / SiO2

MLD

Wave Precision

Baked at 400 C for 1 hr 

S/N 10

3" x 1"

E010064-A

D010067-B

Coated with Nb2O5 / SiO2

MLD

Wave Precision

 Baked at 400  C for 1 hr

S/N 11

3" x 1"

 E010064-A

D010067-B

 Ta2O5 / Al2O3
Coated at MLD 45 layers

Glasgow

Wave Precision

  Identified as XI on barrel. Parts have been coated for 64ppm Trans. Baked at 350 C 

S/N 12

3" x 1"

 E010064-A

D010067-B

 

Stanford

Wave Precision

  Identified as XII on barrel

S/N 13

3" x 1"

E010064-A

D010067-B

To be annealed for Ta2O5/SiO2

Glasgow

Wave Precision

 Annealed at MLD 450  C 

S/N 14

3" x 1"

 E010064-A

D010067-B

 Ta2O5/SiO2
1/8 - 1/8 wave

         60 layers - SMA

Glasgow

Wave Precision

  Identified as XIV on barrel.

Annealed at 600 C

S/N 15

3" x 1"

 E010064-A

D010067-B

 Ta2O5 / Al2O3
Coated at MLD 45 layers

Glasgow

Wave Precision

  Identified as XV on barrel.  Parts have been coated for 64ppm Trans. Baked at 350  C 

S/N 16

3" x 1"

E010064-A

D010067-B

30 layers
Ta2O5 / Al2O3
Coated at WaveP

Glasgow

Wave Precision

 Annealed at 350 C for 12 hr 

S/N 17

3" x 1"

E010064-A

D010067-B

Annealed at 350 C as control for Ta2O5 / Al2O3

Glasgow

Wave Precision

Annealed for 12 hr, then annealed in Glasgow for at 1000 C over 26 days

S/N 18

3" x 1"

E010064-A

D010067-B

Ta2O5/SiO2
1/4wave-

30 layers-MLD

Glasgow

Wave Precision

Annealed at MLD 450  C 

S/N 19

3" x 1"

E010064-A

D010067-B

Ta2O5/SiO2
1/4wave-

30 layers-MLD

Glasgow

Wave Precision

Annealed at MLD 450  C 

S/N 20

3" x 1"

E010064-A

D010067-B

Annealed at MLD

Glasgow

Wave Precision

Baked at 400 C for 1 hr 

S/N 21

3” x 1”

E010064-A

D010067-B

Annealed at WP

Glasgow

 

 

S/N 22

3" x 1"

 

E010064-A

 

D010067-B

 

MLD

30 layers  Al2O3 / SiO2

Glasgow

 

Wave Precision

 

Baked at 400 C

S/N 23

3" x 1"

 

E010064-A

 

D010067-B

 

SMA - 30 layers

F1 – Ta2O5 / SiO2

Glasgow

 

Wave Precision

 

Annealed at 600 C

SMA run #03014

 

S/N 27

3" x 1"

E010064-A

D010067-B

30 layers
Ta2O5 / Al2O3
Coated at WaveP

Glasgow

Wave Precision

Annealed at 350 C for 12 hr 

S/N 28

3" x 1"

 

E010064-A

 

D010067-B

 

MLD

30 layers  Al2O3 / SiO2

Glasgow

 

Wave Precision

 

Baked at 400 C

S/N 29

3" x 1"

 

E010064-A

 

D010067-B

 

30 layers - LMA

F4 – Ta2O5 / SiO2

Glasgow

Wave Precision

 

Absorption measured at LMA: 3.0 ppm

SMA run # C040681

S/N 30

3" x 1"

 

E010064-A

 

D010067-B

 

 

Glasgow

Wave Precision

 

 

S/N 31

3" x 1"

 

E010064-A

 

D010067-B

 

30 layers - LMA

F5 – Ta2O5 / SiO2

 

Glasgow

 

Coated in the VIRGO coater –

Absorption measured at LMA: 0.9 ppm

SMA run # C040762

S/N 33

3" x 1"

 

E010064-A

 

D010067-B

 

30 layers - LMA

F2 – Ta2O5 / SiO2

Glasgow

Wave Precision

 

Absorption measured at LMA: 1.1 ppm

SMA run # 04056/21

S/N 34

3" x 1"

 

E010064-A

 

D010067-B

 

SCIRO - First coating

 

 

Annealed at 300 C for 2 hours-

Absorption ~162 ppm to 169 ppm

S/N 35

3" x 1"

 

E010064-A

 

D010067-B

 

30 layers - LMA

F3 – Ta2O5 / SiO2

Glasgow

Wave Precision

 

Absorption measured at LMA: 1.0 ppm

SMA run # 04068/3

S/N 36

3" x 1"

 

E010064-A

 

D010067-B

 

Annealed at LMA

Glasgow

Wave Precision

 

 

S/N 39

3" x 1"

 

E010064-A

 

D010067-B

 

Coated at CSIRO

Glasgow

 

4.65 microns of tantala on it which has been annealed to approx zero stress (0 +/- 10 MPa).

S/N 44

3" x 1"

 

E010064-A

 

D010067-B

 

SiO2 – 25 layer

Glasgow

Wave Precision

 

Annealed at 400 C

SMA run #C0402021

S/N 45

3" x 1"

 

E010064-A

 

D010067-B

 

Single layer - LMA

F1 –Doped Ta2O5

Glasgow

Wave Precision

 

Annealed at 400 C

SMA run # 0402321

S/N 47

3" x 1"

 

E010064-A

 

D010067-B

 

(HfL)15

 

Wave Precision

Coating broke down

SMA run #0401721- 500C anneal

S/N 48

3" x 1"

 

E010064-A

 

D010067-B

 

CSIRO - 30 layers

Ta2O5 / SiO2

 

 

Sputtered with Xenon

S/N A1

3" x 1"

 

E010064-A

 

D010067-B

 

Ta2O5 thick layer - LMA

Glasgow

Wave Precision

 

Annealed at 600 C – Coating cracked

No S/N

3" x 1"

 

E010064-A

 

D010067-B

 

CSIRO – 30 layer

Ta2O5 / SiO2

Glasgow

Wave Precision

 

 

S/N IPO12

3" x 1"

E010064-A

 

D010067-B

 

CSIRO – 30 layer

 

Glasgow

REO

 

30 lyrs. HfO2/SiO2 - 300 C for 24hrs

S/N 212

 

3" x 1"

E010064-A

 

D010067-B

 

CSIRO – 30 layer

 

Glasgow

REO

 

30 lyrs. 30% SiO2 in HfO2/SiO2 -550C  for 24hrs

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

For "Q"  measurement results see: LIGO-MIT Coating Experiment

Optical Absorption - Measurements Results

Optical Absorption has been measured at Stanford University
Coated samples are 1" dia.x 0.250" thick superpolished fused silica substrates. (Standard Wave Precision Part # GO-FS100-1)

 

Serial No.

Coating Material

Annealing Temp.

PCI Loss (PPM)

Notes

5584

Ta2O5/SiO2

250 C 

1.71

 

5700

"

"

1.65

 

0358

"

"

1.65

 

5638

"

300 C

1.24 

 

 5698

 1.30

 

 0321

"

 1.15

 

 5721

 "

 350 C

0.75 

 

 5723

"

 

 0.78

  ~4mm wide bump to 3.2ppm

 0372

 "

 

 0.70

 

 8203

 "

400 C

 0.65

 

 8107

 "

 450 C

 0.44

 

 8174

 "

 450 C

 0.43

 

 8233

 "

500 C

 0.40

  2mm wide bump to 4ppm

 8118

 "

 not annealed

 11.50

 

 

 

 

 

 

 5601

 Nb2O5/SiO2

 300 C

 1.17

 

-300 

1.30 

 

 0230

 "

 1.18

 

 5695

"

 350 C

 0.78

 

 6366

 "

 "

 0.76

 

 -350

 "

 0.76

 

 5592

 "

400 C "

 0.45

 

 6673

 "

 "

 0.42

 >2mm wide bump to 1.1ppm

 -400

 "

 "

 0.40

 

 

 

 

 

 

 5624

 ZrO2/SiO2

 300 C

21.70 

 

 5716

 "

 22.85

 

 0342

 "

"

 23.50

 

 5697

 "

350 C

 19.95

 

 5046

 "

 "

 19.80

 

 0363

 "

 "

 19.20

 

 5635

 "

400 C

 11.60

 

 5696

 "

 "

 12.03

 

 0290

 "

 "

 11.60

 

 

 

 

 

 

 5564

 Ta2O5/SiO2

 300 C

3.24 

 

 5572

 "

"

 2.67

 

 0689

 "

 3.29

 

 5567

 "

350 C

 1.41

 

 5583

 "

 1.46

 Localized bumps to 15ppm

 0687

 "

 "

 2.19

 

 5701

 "

400 C

 1.17

 

 5728

 "

 1.13

 

 0693

 "

 "

 1.84

 

9286 

HfO2

No anneal

 

 LMA-30 layers

9400

HfO2

400 C

 

LMA -30 layers

9319

HfO2

400 C

 

LMA-30 layers

9321

HfO2

500 C

 

LMA-30 layers

#4

Doped Ta2O5

 

 

Al2O3 subst.C-axis-LMA

#3

Doped Ta2O5

 

 

Al2O3 subst.C-axis-LMA

8134

Formula 2

 

 

LMA-Run 04056/12

8191

Formula 2

 

 

LMA-Run 04056/12

8139

Formula 3- sapphire

 

13.4

LMA-Run 04075/11

9353

Formula 1-Single layer H*

 

 

LMA-Run 04023/11

9396

Formula 1- Single layer H*

 

 

LMA-Run 04023/13

9314

Single layer SiO2

 

 

LMA-Run 04020/11

9348

Single layer SiO2

 

 

LMA-Run 04020/11

11432

30 layers

300 C -24hrs

90.9

HfO2/SiO2 - CSIRO

11372

30 layers

300 C -24hrs

92.6

HfO2/SiO2 - CSIRO

10317

30 layers

300 C -24hrs

73.6

HfO2/SiO2 - CSIRO

10353

30 layers

300 C -24hrs

79

HfO2/SiO2 - CSIRO

018-Q1

30 layers

550 C - 24 hrs

8

70% HfO 30% SiO/SiO2

CSIRO

014-Q1

30 layers

550 C - 24 hrs

7.2

70% HfO 30% SiO/SiO2

CSIRO

024-Q1

30 layers

550 C - 24 hrs

6.85

70% HfO 30% SiO/SiO2

CSIRO

11251

30 layers

550 C - 24 hrs

6.85

70% HfO 30% SiO/SiO2

CSIRO

1.0-037-01 

 30 layers

 600 C for 24 hours

2.53

 ~20%TiO2/Ta2O5/SiO2

CSIRO

11439

 30 layers

 600 C for 24 hours

1.19

 ~40%TiO2/Ta2O5/SiO2

CSIRO